Complex architecture fabrication with photosensitive PEEK-based ink via vat photopolymerization and two-step thermal treatment

This study presents a photosensitive PEEK-based ink for vat photopolymerization, enabling high-resolution printing and improved performance via two-step thermal treatment. Optimized for printability, crystallinity, and material properties, the method enhances PEEK’s thermal, mechanical, and corrosion resistance, expanding its application potential beyond extrusion-based limitations.

https://doi.org/10.1016/j.addma.2025.104840